Proceedings of 2015 Photonics & Electromagnetics Research Symposium, Prague, July 6 - 9,Page(s)1182-1186
Abstract
This paper reports broadband THz free-space transmission measurements and
modeling of indium-tin-oxide (ITO) thin films on p-doped Si substrates. Two such samples having
ITO thickness of 50 and 100 nm, and DC sheet conductance 260 and 56 Ω/sq, respectively, were
characterized between 0.2 and 1.2 THz using a frequency-domain spectrometer. The 50-nm-film
sample displayed very flat transmittance over the 1-THz bandwidth, suggesting it is close to the
critical THz sheet conductance that suppresses multi-pass interference and thereby achieves THz
passive equalization. This is consistent with a simple transmission-line (TEM wave) model of the
propagation. Also, the value of THz sheet conductance that best fits the transmittance data is
roughly 50% higher than the dc value for both samples, suggesting that the ac conductivity is
non-Drudian.
Citation
Elliott R. Brown,
H. Chen,
G. T. Mearini,
and
Weidong Zhang,
"THz Characterization of ITO Films on p-Si Substrates," Proceedings of 2015 Photonics & Electromagnetics Research Symposium, Prague, July 6 - 9,Page(s)1182-1186