In this paper, we demonstrate a new method of fabricating large-area well-ordered nano-cones using colloidal lithography and inductively coupled plasma (ICP) dry etching, and discuss the anti-reflectance performance. In the fabrication, we use SiO2 nano-particles as the mask. Its selectivity in different reacting gases in ICP can result in different shapes of nanostruc- tures. Before the etching, we use methanol-assisted self-assembly at the air/water interface to form the patterns. Different ICP etching recipes are used to form rod-shaped and cone-shaped nanowires with the same height and period. The resultant nano-cone structures are well-shaped with smooth side walls. After the fabrication, the anti-reflection performance is measured and compared, which shows that cone-shaped nanowires can reduce the surface reflection to lower than 4% over the wavelength range of 400–900 nm, while nano-rods can only keep this value at approximately 6%. Theoretical simulations are also carried out using Comsol, which confirm that nano-cones provide better anti-reflectance performance.